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게이트를 상정한 니켈 실리사이드 박막의 물성과 미세구조 변화
정영순,송오성,김상엽,최용윤,김종준,Jung Youngsoon,Song Ohsung,Kim Sangyoeb,Choi Yongyun,Kim Chongjun 한국재료학회 2005 한국재료학회지 Vol.15 No.5
We fabricated nickel silicide layers on whole non-patterned wafers from $p-Si(100)SiO_2(200nm)$/poly-Si(70 nm)mn(40 nm) structure by 40 sec rapid thermal annealing of $500\~900^{\circ}C$. The sheet resistance, cross-sectional microstructure, surface roughness, and phase analysis were investigated by a four point probe, a field emission scanning electron microscope, a scanning probe microscope, and an X-ray diffractometer, respectively. Sheet resistance was as small as $7\Omega/sq$. even at the elevated temperature of $900^{\circ}C$. The silicide thickness and surface roughness increased as silicidation temperature increased. We confirmed the nickel silicides iron thin nickel/poly-silicon structures would be a mixture of NiSi and $NiSi_2$ even at the $NiSi_2$ stable temperature region.
코발트/니켈 복합실리사이드의 실리사이드온도에 따른 면저항과 미세구조 변화
정영순,정성희,송오성,Jung Young-soon,Cheong Seong-hwee,Song Oh-sung 한국재료학회 2004 한국재료학회지 Vol.14 No.6
The silicide layer used as a diffusion barrier in microelectronics is typically required to be below 50 nm-thick and, the same time, the silicides also need to have low contact resistance without agglomeration at high processing temperatures. We fabricated Si(100)/15 nm-Ni/15 nm-Co samples with a thermal evaporator, and annealed the samples for 40 seconds at temperatures ranging from $700^{\circ}C$ to $1100^{\circ}C$ using rapid thermal annealing. We investigated microstructural and compositional changes during annealing using transmission electron microscopy and auger electron spectroscopy. Sheet resistance of the annealed sample stack was measured with a four point probe. The sheet resistance measurements for our proposed Co/Ni composite silicide was below 8 $\Omega$/sq. even after annealing $1100^{\circ}C$, while conventional nickel-monosilicide showed abrupt phase transformation at $700^{\circ}C$. Microstructure and auger depth profiling showed that the silicides in our sample consisted of intermixed phases of $CoNiSi_{x}$ and NiSi. It was noticed that NiSi grew rapidly at the silicon interface with increasing annealing temperature without transforming into $NiSi_2$. Our results imply that Co/Ni composite silicide should have excellent high temperature stability even in post-silicidation processes.
직접접합 실리콘/실리콘질화막//실리콘산화막/실리콘 기판쌍의 선형가열에 의한 보이드 결함 제거
정영순,송오성,김득중,주영철,Jung Youngsoon,Song Ohsung,Kim Dugjoong,Joo Youngcheol 한국재료학회 2004 한국재료학회지 Vol.14 No.5
The void evolution in direct bonding process of $Si/Si_3$$N_4$ ∥ $SiO_2$/Si silicon wafer pairs has been investigated with an infrared camera. The voids that formed in the premating process grew in the conventional furnace annealing process at a temperature of $600^{\circ}C$. The voids are never shrunken even with the additional annealing process at the higher temperatures. We observed that the voids became smaller and disappeared with sequential scanning by our newly proposed fast linear annealing(FLA). FLA irradiates the focused line-shape halogen light on the surface while wafer moves from one edge to the other. We also propose the void shrinking mechanism in FLA with the finite differential method (FDM). Our results imply that we may eliminate the voids and enhance the yield for the direct bonding of wafer pairs by employing FLA.
정영순,임선영,Jung, Young-soon,Lim, Sun-young 중소기업융합학회 2021 융합정보논문지 Vol.11 No.4
본 연구는 졸업 학년 간호대학생의 핵심간호역량에 영향을 미치는 요인을 조사하기 위해 시도되었다. 연구대상자는 울산광역시 소재 C 대학에 재학 중인 간호학과 4학년 학생 178명이었고, 구조화된 설문지를 통해 자료를 수집하였다. 수집된 자료는 SPSS 25.0 프로그램을 이용하여 t-test, ANOVA, Pearson Correlation Coefficien과 Multiple stepwise regression으로 분석하였다. 연구결과 핵심간호역량에 영향을 미치는 요인을 확인한 모형은 유의한 것으로 나타났고(F=7.75, p<.001), 전공만족도(=0.44, p<.001), 비판적사고(=0.29, p=.003), 전문직관(=0.22, p=.009), 셀프리더십(=0.17, p<.001)이 영향요인으로 나타났으며. 핵심간호역량에 대한 이들 변인의 설명력은 23.4%이었다. 따라서 졸업 학년간호대학생의 핵심간호역량을 증진시키기 위한 프로그램 개발의 기초 자료로 활용할 수 있을 것이다. The purpose of this study is to investigate factors attecting the core nursing competence of senior nursing students.. The subjects who participated in this study were 178 students in the 4th year of nursing at one college in the Ulsan were surveyed using a structured questionnairs. Independent t-test, one way ANOVA and Pearson's corrlation coefficient, Stepwise regression were performed on the collected data using SPSS 25.0 program. Study finding revealed that major satisfaction(=0.44, p<.001), clitical thinking(=0.29, p=.003), nursing professionalism(=0.22, p=.009), and self-leadership(=0.17, p<.001) about core nursing competence were siginificant predictive variables(F=7.75, p<.001). This variables accounted for 23.4% of the variance in core nursing competency. Therefore, it is necessary to develp and apply program to improve core nursing competency in senoir nursing students.
정영순(Youngsoon Jung),송오성(Ohsung Song),김득중(Dugjoong Kim),최용윤(Yongyun Choi),김종준(Chongjun Kim) 한국표면공학회 2005 한국표면공학회지 Vol.38 No.1
We prepared nickel silicide layers from p-Si(100)/SiO₂(2000 Å)/poly-Si(700 Å)/Ni(400 Å) structures, feasible for gates in MOSFETs, by annealing them from 500℃~900℃ for 30 minutes. We measured the color coordination in visible range, cross sectional micro-structure, and surface topology with annealing temperature by an UV-VIS-IR spectrometer, field effect scanning electron microscope(FE-SEM), and scanning probe microscope respectively. We conclude that we may identify the nickel silicide by color difference of 0.90 and predict the silicide process reliability by color coordination measurement. The nickel silicide layers showed similar thickness while the columnar grains size and surface roughness increased as annealing temperature increased.
나노두께 퍼말로이에서의 계면효과에 의한 자기적 물성 변화
정영순(Young soon Jung),송오성(Oh sung Song) 한국자기학회 2004 韓國磁氣學會誌 Vol.14 No.5
We prepared ultra thin film structure of Si(100)/SiO₂(200 ㎚)/Ta(5 ㎚)/Ni_(80)Fe_(20)(1~15 ㎚)/Ta(5 ㎚) using an inductively coupled plasma(ICP) helicon sputter. Magnetic properties and cross-sectional microstructures were investigated with a superconduction quantum interference device(SQUID) and a transmission electron microscope(TEM), respectively. We report that NiFe films of sub-3 ㎚ thickness show the Bbulk=0 and Bsurf=-3 × 10^(-7)(J/㎡). Moreover, Curie temperature may be lowered by decreasing thickness. Coercivity become larger as temperature decreased with 0.5 ㎚ - thick Ta/NiFe interface intermixing. Our result implies that effective magnetic properties of magnetoelastic anisotropy, saturation magnetization, and coercivity may change abruptly in nano-thick films. Thus we should consider those abrupt changes in designing nano-devices such as MRAM applications.
루테늄과 바나듐을 중간층으로 삽입한 인위적페리층의 교환작용과 미세구조
정영순(Youngsoon Jung),송오성(Ohsung Song),윤종승(Chong Seung Yoon) 한국자기학회 2003 韓國磁氣學會誌 Vol.13 No.5
We fabricated the synthetic ferrimagnetic layers (SyFL) of permalloy/X (X=Ru, V)/permalloy by varying the X thickness, and investigated the changes of coercivity (Hc), spin flopping field (Hsf), and saturation magnetization field (Hs) with a superconducting quantum interference device (SQUID). We also observed the microstructure with a cross sectional transmission electron microscope (TEM). Permalloy SyFL had less than 10 Oe coercivity, and Hsf and Hs could be tuned by varying ruthenium and vanadium layer thickness. The comparatively small exchange coupling in permalloy-V SyFL was caused by the intermixing of permalloy and vanadium decreasing the effective exchange coupling thickness.