http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
매니폴드 노즐 형상변화가 웨이퍼 캐리어 내부 유동특성에 미치는 영향
정문기(M.K. Jung),강병화(B.H. Kang),강현영(H.Y. Kang),양연희(Y.H. Yang),김요환(Y.H. Kim),김윤제(Y.J. Kim) 대한기계학회 2018 대한기계학회 춘추학술대회 Vol.2018 No.12
Wafer carrier is important equipment in semiconductor manufacturing processes which is used to remove contaminants from wafers by purging gas. However, having a uniform purging gas is difficult because the purging gas inlet in the wafer carrier is located at the lower left of the carrier. As a result, uneven flow patterns are formed inside the carrier, so that contamination of the wafer can not be smoothly removed. The numerical analysis was conducted to investigate the effect of manifold nozzle shape change on the flow characteristics of a wafer carrier using ANSYS Fluent 18.1. The turbulence kinetic energy and velocity distributions are investigated to obtain the most efficient aspect ratio of the nozzle(η).