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장윤창,노현준,박설혜,정상민,Sanywon Ryu,권지원,김남균,김곤호 한국물리학회 2019 Current Applied Physics Vol.19 No.10
A phenomenology-based virtual metrology (VM) for monitoring SiO2 etching depth was proposed by Park (2015). It achieved high prediction accuracy by introducing newly developed plasma information (PI) variables as designated inputs, called PI-VM. The PI variables represent the state of the plasma, the sheath, and the target during the process. We investigate how a PI variable can help to improve prediction accuracy of VM and how it plays a special role in the statistical selection. We choose only PIEEDF among the three PI variables to focus on the investigation. The PIEEDF is determined from the ratio of line-intensities of optical emission spectroscopy. We apply Pearson's correlation filter (PCF), principal component analysis (PCA), and stepwise variable selection (SVS) as statistical selection methods on the variables set including PIEEDF or not. Multilinear regression is used to model the VM. This study reveals that PIEEDF variable is a good variable in terms of independence from other input variables and explanatory power for an output variable. Especially, VM using SVS method applied to variable sets including PIEEDF achieves the highest accuracy, comparable to Park's PI-VM. This study shows that PIEEDF variable is particularly useful for monitoring of the fine variations in semiconductor manufacturing process and it also extends the utilization of OES sensor data.
장윤창 한국스포츠리서치 2003 한국 스포츠 리서치 Vol.14 No.6
Four principle sources of information can be used to enhance self-efficacy, including performance accomplishment, vicarious experience, verbal persuasion, and physiological or emotional arousal. Self-efficacy measurement is typically constructed relative to a specific task. In constructing self-efficacy measures, the constructor must understand that self-efficacy differs in level, strength, and generality. Investigators also should report reliability data and include instruments in articles.
한국 프로 스포츠의 복지정책에 대한 법적제도 및 복지사업 운영 규정
장윤창 한국스포츠리서치 2003 한국 스포츠 리서치 Vol.14 No.6
The purpose of this study was to closely analyse the current status of professional sport welfare policy in Korea and to propose the progressive views of it. The problems of welfare policies and system in relation to professional sport in Korea, especially those of player-related welfare policies and system were examined and on the base of it proposed desirable alternatives. Depth interview and a secondary analyses were used for qualititive research. The implications of the study are as follows; The referent frame to analyse the professional sport welfare policy in Korea was composed with six different factors such as retirement, player treatment, livelihood assistance, welfare facilities, insurance and pension. The views through depth interviews on the factors above are firstly to assist players' basic livelihood and also need some legal provision. It is suggested that players' agent and players' council are essential for the future development of professional sport welfare policies in Korea.
플라즈마 정보인자를 활용한 SiO<sub>2</sub> 식각 깊이 가상 계측 모델의 특성 인자 역할 분석
장윤창,박설혜,정상민,유상원,김곤호,Jang, Yun Chang,Park, Seol Hye,Jeong, Sang Min,Ryu, Sang Won,Kim, Gon Ho 한국반도체디스플레이기술학회 2019 반도체디스플레이기술학회지 Vol.18 No.4
We analyzed how the features in plasma information based virtual metrology (PI-VM) for SiO2 etching depth with variation of 5% contribute to the prediction accuracy, which is previously developed by Jang. As a single feature, the explanatory power to the process results is in the order of plasma information about electron energy distribution function (PIEEDF), equipment, and optical emission spectroscopy (OES) features. In the procedure of stepwise variable selection (SVS), OES features are selected after PIEEDF. Informative vector for developed PI-VM also shows relatively high correlation between OES features and etching depth. This is because the reaction rate of each chemical species that governs the etching depth can be sensitively monitored when OES features are used with PIEEDF. Securing PIEEDF is important for the development of virtual metrology (VM) for prediction of process results. The role of PIEEDF as an independent feature and the ability to monitor variation of plasma thermal state can make other features in the procedure of SVS more sensitive to the process results. It is expected that fault detection and classification (FDC) can be effectively developed by using the PI-VM.
할로겐 플라즈마에 의한 Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> 식각 데미지 연구
장윤창,유찬영,유상원,권지원,김곤호,Jang, Yun Chang,Yoo, Chan Young,Ryu, Sangwon,Kwon, Ji Won,Kim, Gon Ho 한국반도체디스플레이기술학회 2019 반도체디스플레이기술학회지 Vol.18 No.4
Effect of Ge2Sb2Te5 (GST) chalcogen composition on plasma induced damage was investigated by using Ar ions and F radicals. Experiments were carried out with three different modes; the physical etching, the chemical etching, and the ion-enhanced chemical etching mode. For the physical etching by Ar ions, the sputtering yield was obtained according to ion bombarding energy and there was no change in GST composition ratio. In the plasma mode, the lowest etch rate was measured at the same applied power and there was also no plasma induced damage. In the ion-enhanced chemical etching conditions irradiated with high energy ions and F halogen radicals, the GST composition ratio was changed according to the density of F radicals, resulting in higher roughness of the etched surface. The change of GST composition ratio in halogen plasma is caused by the volatility difference of GST-halogen compounds with high energy ions over than the activation energy of surface reactions.