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RF magnetron 스퍼터링법으로 증착한 BaTiO₃박막의 제조 및 그 특성
류창명,이쟁성,이석헌,김창균,이용현 경북대학교 센서기술연구소 1995 센서技術學術大會論文集 Vol.6 No.1
BaTiO_(3) thin films were prepared by RF magnetron sputtering on the silicon substrates. The stoichiometric BaTiO_(3) thin film was obtained by manufacturing the target that has its mole ratio of 2BaCO_(3)and TiO_(2). The deposition characteristics was investigated under the various substrate temperatures(room temp.~600℃) and oxygen partial pressures. Working pressure, rf power, and target-substrate distance were 30mTorr, 100W, and 60mm, respectively. Under these conditions, the deposited BaTiO_(3) thin film was amorphous-like. The deposition rate decreases as the substrate temperature increases. When the oxygen partial pressure increases, refractive index and deposition rate decreases. After post-annealing at 630℃ for 60minutes at oxygen ambient, the film has the perovskite structure which has confirmed by X-ray diffraction(XRD) peaks, and it has ferroelectric property which was observed by P-E hysteresis loop,
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