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도서지역 사회복지의 환경, 자원, 욕구분석을 통한 지역복지 증진방안
김병록(Kim Byung-Rok),유정욱(Ryu Jung-Wook) 한국지역사회학회 2006 지역사회연구 Vol.14 No.4
The state of the art of island community welfare can be explained through the system theoretical analysis of welfare environment, resource, and needs in Sinan-gyun, where is a local government composed of islands. The poor environment of island community welfare restricts provision of proper input(resource) to island community system, which make development and delivery of welfare service difficult. Insufficient welfare service increases negatively welfare needs, which make welfare environment worse ultimately. This vicious cycle of welfare environment, resources, and needs in island community should be unconnected by choice and focus strategy and community organizing strategy in service delivery of island community welfare.
이수영,강경묵,유정욱 서울産業大學校 1997 논문집 Vol.45 No.1
Generalized treatment of the polyprotic cation potentiometric titration curve has been carried out by a bisection technique. In this work a forth-degree polynomial in proton, which in involves the equilibrium constants for the complex metal cation titration reation has been developed. The curves are simulated for various equilibrium constant and proton concentration. The effects on the plot of errors in pH and in the K constant and the ways of pH calculation are discussed, together with ways of optimizing the pH calculation .
Positive형인 Naphthoquinone Diazide 유도체의 감광특성
강경묵,이수영,유정욱 서울産業大學校 1997 논문집 Vol.45 No.1
naphthoquinone - 1,2 - diazide -5- sulfony1[NQDA] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m - cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NQDA derivatives were photoconverted and developer - soluble photoresist were produced. The mixing ratio of 1 :4(by mass) of NQDA + p-hydroxybenzophenone+sensitizer and m - cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.