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저 에너지 초소형 전자칼럼 리소그래피를 이용한 SiO₂ 박막의 Pattern 제작에 관한 연구
요시모토 다카토시(T. Yoshimoto),김호섭(H. S. Kim),김대욱(D. W. Kim),안승준(S. Ahn) 한국자기학회 2007 韓國磁氣學會誌 Vol.17 No.4
Electron beam lithography has been studied as a next-generation lithography technology instead of photo lithography for ULSI semiconductor devices. In this work, we have made a low-energy electron beam lithography system based on the microcolumn and investigated the dependence of the pattern thickness on the energies and dose concentration of the electron beam. We have also demonstrated the potential of low-energy lithography by achieving 100 ㎚-SiO₂ thin film patterning.