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최자영,권영춘,여상학,정동근 성균관대학교 기초과학연구소 1999 論文集 Vol.50 No.-
In this work, we report on the investigation of the properties of cyclohexane-based plasma polymers (CHexPP) as functions of the deposition pressure and the plasma power. As the deposition pressure was decreased from 2 torr to 0.2 ton with a fixed plasma power of 60W, k value of the CHexPP thin film increased from 2.42 to 3.24. CHexPP thin films deposited at lower deposition pressure showed very good thermal stability, even the one deposited at 0.2 torn was stable up to 400℃. As the plasma power was increased from 10W to 90W with a fixed deposition pressure of 0.2 ton, k value increased from 2.61 to 3.39. The CHexPP thin film deposited at 90W were stable up to 450℃. All the deposited films were insulating. Under applied fields less than 1 MV/cm, leakage current densities were less than 10^-7 A/㎠.