MOCVD에 의한 ZnO 합성에서 기체혼합비가 박막의 물성에 미치는 영향

서문규,이종인,SeoMoon, Kyu,Lee, JongIn 한국전기전자재료학회 2013 전기전자재료학회논문지 Vol.26 No.2

ZnO thin films were synthesized on Si substrates by MOCVD using diethyl zinc as a precursor. Effects of $O_2$/DEZ gas mixing ratio on the growth rate, surface morphology, preferred orientation, and electrical properties of the ZnO thin films were investigated with SEM, XRD, and Hall measurement. The surface reflectance variations of ZnO thin films were analyzed using laser-photometer apparatus. As the $O_2$/DEZ mixing ratio increased, growth rate and $I_{(002)}/I_{(101)}$ in XRD of ZnO thin films decreased, and the crystal structure was changed from columnar to planar structure. All ZnO films deposited at various CVD conditions exhibited c-axis (002) plane preferred orientation. The electrical properties of ZnO thin films mainly depended on the carrier mobility.

C₂H₂ ( /C₂H ) As the Growth Species of Thermal CVD Diamond System

서문규 ( Seomoon Kyu ),이재신 ( Lee Jae Shin ),이지화 ( Lee Jee Hwa ) 한국공업화학회 1991 한국공업화학회 연구논문 초록집 Vol.1991 No.0

최근에 기상반응을 이용한 저압 다이아몬드 합성에 관한 연구가 활발히 수행되고 있으나 아직 활성종이 무엇인지에 대한 정확한 규명이 이루어지지않고 있다. 이는 기상반응 기구에 대한 정확한 실험이 이루어지지 못한 때문이기도 하다. 따라서 본 실험에서는 세라믹 probe로 질량분석기에 연결하여 실험조건에서의 기상분석을 통하여 활성종이 무엇인가에 대한 연구를 in situ로 진행하였다. 안정한 화합물인 CH₄와 C₂H₂의 압력에 대한 변화량과 이에대한 성장속도를 비교 하였고 SEM, XRD, RAMAN등을 이용한 분석결과도 이용하였다. 나타난 성장속도와 열평형 계산에 의한 결과를 비교하여 볼 때, 활성종으로서 C₂H₂가 제시되었는데 이는 질량분석기를 이용한 결과와도 잘 일치한다.

원격 플라즈마 중합된 메틸메타크릴레이트 필름의 분광학적 분석

서문규 ( Kyu Seomoon ) 한국공업화학회 2021 공업화학 Vol.32 No.1

메틸 메타크릴레이트 분자를 전구체로 사용하여 원격 플라즈마 방식으로 중합체를 합성하는 반응에서 플라즈마 출력, 반응 압력 및 직접-간접 플라즈마 방식이 필름의 성장속도 및 화학결합 구조에 미치는 영향을 조사하였으며, FT-IR, XPS 등 분광학적 분석과 Langmüir 탐침을 사용한 플라즈마 특성 진단 결과와 함께 고찰하였다. 플라즈마 출력과 반응압력이 증가하면 성장속도가 증가하지만 특정 영역을 넘어서면 식각 효과와 잦은 충돌로 인해 활성화 효율이 낮아져 다시 감소하였다. 중합 필름의 FT-IR과 XPS 분석 결과, 필름 내 탄소/산소 조성비는 플라즈마 출력이 커질수록 증가하였으며, 탄화수소성 C-C 탄소 조성비는 증가하는 반면 에스터성 COO 탄소 조성비는 감소하였다. 직접 플라즈마법이 간접 플라즈마법에 비해 필름의 성장속도는 2~5배 빠르지만, 전구체의 분자 구조를 유지하기 위해서는 간접 플라즈마법이 유리함을 확인하였다. Plasma-polymerized methyl methacrylate (MMA) thin films were synthesized by remote plasma, and effects of plasma power, reaction pressure and direct-indirect plasma on the growth rate and chemical bonding were investigated with alpha-step, FT-IR, XPS and Langmüir probe method. As the plasma power and pressure increased, the tendency of growth rate showed maximum value at a certain range. FT-IR and XPS analyses revealed that composition ratio of C/O and hydrocarbon (C-C) % in the deposited films increased with plasma power, but ester (COO) C % decreased with it. Direct plasma method was effective for fast growth rate, but indirect plasma method was favorable for maintaining the chemical structure of MMA.

에틸메타크릴레이트 증기 분위기에서 코로나 방전 처리한 PVDF 필름의 XPS 분석

문희권 ( Huikwon Moon ),서문규 ( Kyu Seomoon ) 한국공업화학회 2016 공업화학 Vol.27 No.6

PVDF-PVC 적층필름의 계면접착력을 향상시키기 위한 새로운 방법으로 PVDF 필름 표면에 유전체장벽 코로나 방전을 통한 EMA 단량체 커플링을 시도하였다. EMA 1% 분위기에서 코로나 표면처리한 PVDF 필름을 사용하여 제조한 PVDF-PVC 적층필름의 계면접착력은 코로나 처리하지 않은 PVDF에 비해 현저히 향상되었다. 코로나 방전처리에 의해 PVDF 필름 표면의 접촉각은 현저히 감소하였다. XPS 분석 결과, 코로나 처리에 의해 필름 표면의 탄소와 산소함량은 증가하는 반면 불소 함량은 감소하였다. XPS C_1s 피크의 curve fitting 결과, 코로나 방전 처리에 의해 비극성C-C 결합 탄소와 산소와 결합하는 탄소의 비율은 점차 증가한 반면, 불소와 결합하는 탄소의 비율은 크게 감소하는 경향을 나타내었다. Ethyl methacrylate (EMA) monomer coupling onto the polyvinylidene fluoride (PVDF) film surface was attempted to enhance the interfacial adhesive force between PVDF-polyvinyl chloride (PVC) bilayer films via dielectric barrier corona discharge. The interfacial forces were quite enhanced when PVDF films were treated by corona discharge in an EMA 1% atmosphere. The contact angle of PVDF films decreased due to corona treatment. X-ray photoelectron spectroscopy (XPS) analysis showed that the carbon and oxygen content of the PVDF film surface increased with corona discharge while the fluoride content decreased. The curve fitting of XPS C_1s peaks revealed that the non-polar C-C bonded carbon and oxygen-bonded carbon increased gradually with corona treatment, while the fluorine-bonded carbon decreased.

원격 플라즈마 화학기상증착법에 의해 중합된 아크릴산 필름의 XPS 분석

김성훈 ( Seong Hoon Kim ),서문규 ( Kyu Seomoon ) 한국공업화학회 2009 공업화학 Vol.20 No.5

Properties of Low-Temperature Passivation of Silicon with ALD Al_2O_3 Films and their PV Applications

Kwang-Ho Kim,Hyun-Jun Kim,Pyungwoo Jang,Chisup Jung,Kyu Seomoon,서문규 대한금속·재료학회 2011 ELECTRONIC MATERIALS LETTERS Vol.7 No.2

Low-temperature-deposited aluminium oxide (Al_2O_3) thin films were grown on p-type Si substrates by the remote plasma atomic layer deposition (RPALD) technique. The RPALD technique uses an alternative trimethylaluminum precursor and oxygen radicals to obtain good interface properties for metal-insulatorsemiconductor (MIS) inversion-layer solar cell applications. Si MIS capacitors with ultra-thin Al_2O_3 (film thickness ranges from 1 nm to 6 nm) gate dielectric and SiNx films were fabricated at 300°C and at room temperature (RT), respectively. Low-temperature-deposited Al_2O_3 and SiNx films were characterized by electrical properties such as capacitance-voltage (C-V), and current-voltage (I-V). The interface state density (Dit) of the MIS capacitors with SiNx films and without SiNx films was derived from the 1 MHz frequency C-V curves. By using ultra-thin RPALD Al_2O_3, RT-sputtered SiNx films and a simple fabrication-processing sequence, MIS solar cells were fabricated on 1 Ω·cm to 10 Ω·cm p-Si wafers. The fabricated MIS solar cell with passivated Al_2O_3 and SiNx films has 8.21% efficiency.

OPP 접착테이프의 광노화 특성 연구

서문규 청주대학교 2017 産業科學硏究 Vol.35 No.1

Photoaging characteristics of the oriented polypropylene (OPP) adhesive tape and the effect of UV stabilizer addition were investigated with weather-O-meter, colorimeter, FT-IR and XPS. The adhesive force increased about twice in an early photoaging time of 2∼10 hrs, but after that decreased even to zero in photoaging time of 100 hrs. It was known by FT-IR and XPS analyses that C-C and C-H bonds in the adhesive molecules were broken and new C=O, O-H bonds were formed by photoaging. UV stabilizer mixtures such as phenol-phosphite, hindered amine light stabilizer (HALS)-benzophenone, HALS- benzotriazole were effective to enhance the anti-photoaging characterirtics.

On-Line QMA 기법에 의한 다이아몬드 CVD 반응의 기상 분석

서문규 청주대학교 산업과학연구소 1996 産業科學硏究 Vol.14 No.-

Gas phase compositions of the hot filament-assisted diamond CVD reaction were analyzed by on-line quadrupole mass analysis(QMA) technic. Most part of methane was converted into acetylene by thermal decomposion reaction with a hot W filament Initial carburizing process of W filament into WC was ascertained. The pressure variation showed the same tendency between acetylene concentration and diamond growth rate. From these results, it is assumed that acetylene play the role of the reactive species in the diamond CVD reaction.

피셔-트롭스 합성 물질의 GC-MS 분석

서문규 청주대학교 산업과학연구소 2024 産業科學硏究 Vol.41 No.2

Fischer-Tropsch(FT) reaction was performed with Ferrihydrite (Fe:Al:Cu:K, FeOOH·nH2O) catalyst. Effect of gas feed ratio of H2/CO on the composition of FT product was investigated with on-line GC and GC-MS analysis. As the feed ratio of H2/CO increased, the amount of the low molecular weight hydrocarbon compounds below C10 series increased while the amount of hydrocarbon compounds above C11 series decreased.

페리하이드라이트 촉매 합성에서 공침 혼합 속도가 피셔-트롭스 촉매 효율에 미치는 영향

서문규 청주대학교 산업과학연구소 2023 産業科學硏究 Vol.40 No.2

Ferrihydrite (FHYD, Fe:Al:Cu:K, FeOOH·nH2O) catalysts were synthesized by a co-precipitation method and an impregnation method. Effect of co-precipitation mixing speed in the FHYD catalyst synthesis on the catalyst efficiency of Fischer-Tropsch(FT) reactions was investigated with on-line GC analysis. As the co-precipitation mixing time increased from zero to 4 hours, the activity of the FHYD catalyst increased from 1.70 to 3.52 g-CO/g-cat·h and the catalyst efficiency was enhanced.