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ALD-Al₂O₃ 보호층이 적용된 CrAlSiN 코팅막의 내부식성 특성에 관한 연구
만지흠(Zhixin Wan),이우재(Woo-Jae Lee),장경수(Kyung Su Jang),최현진(Hyun-Jin Choi),권세훈(Se Hun Kwon) 한국표면공학회 2017 한국표면공학회지 Vol.50 No.5
Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin Al₂O₃ thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin Al₂O₃ passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD Al₂O₃ thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick Al₂O₃ thin films, which implies that ALD-Al₂O₃ passivation layer can be used as an effect barrier layer of corrosion.
원자층 증착법에 의한 TiO₂, Al₂O₃, 및 TiO₂-Al₂O₃ 나노라미네이트 박막이 316L Stainless Steel의 부식특성에 미치는 영향
이우재(Woo-Jae Lee),만지흠(Zhixin Wan),김다영(Da Young Kim),장경수(Kyung Su Jang),최현진(Hyun-Jin Choi),최우창(Woo-Chang-Choi),권세훈(Se Hun Kwon) 한국표면공학회 2017 한국표면공학회지 Vol.50 No.1
TiO₂, Al₂O₃, and TiO₂-Al₂O₃ nanolaminated films were grown by atomic layer deposition (ALD) on the 316L stainless steel (SS316L) substrates at a temperature of 150 °C. The growth kinetics of ALD-TiO₂ and Al₂O₃ thin films were systematically investigated in order to precisely control the thickness of each layers in the TiO₂-Al₂O3 nanolaminated films using a high-resolution transmission electron microscopy. And, the exact deposition rates of ALD-TiO₂ on Al₂O₃ surface and ALD-Al₂O₃ on TiO₂ surface were revealed to be 0.0284 nm/cycle and 0.11 nm/cycle, respectively. At given growth conditions, the microstructures of TiO₂, Al₂O₃ and TiO₂-Al₂O₃ nanolaminated films were amorphous. The potentiodynamic polarization test revealed that the TiO2-Al2O3 nanolaminated film coated SS316L had a best corrosion resistance, although all ALDcoated SS316L exhibited a clear improvement of the corrosion resistance compared with a bare SS316L.