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김현칠(H.C. Kim),이우일(W.I. Lee) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.11
Nano imprint lithography (NIL) is a polymer embossing technique, capable of transferring nano scale patterns onto a thin film of thermoplastics such as polymethyl methacrylate (PMMA) using this parallel process. Feature size down to 10 ㎚ has been demonstrated. In NIL, the pattern is formed by displacing polymeric material, during which squeezing flow of the viscous liquid takes place. Due to the size of the pattern, a thorough understanding of the process through experiments may not seem feasible. Numerical simulation, therefore, may be utilized to design and optimize the process. Generally, there are two ways of numerical simulation on nano scale flow, namely top-down and bottom-up approach. In top-down approach, polymeric material is assumed be behave as a continuum. On the contrary, the bottom-up approach employs molecular dynamics(MD) technique. However, as the latter method is readily available yet, the top-down approach was used in this study. For the numerical analysis, two dimensional moving grid system was chosen to obtain the accurate prediction of the flow front. Effects of surface tension as well as the slip at the boundary were also considered.