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전해연마면의 표면경도 향상을 위한 플라즈마 이온질화 처리법에 관한 실험적 연구
김진범,홍필기,서태일,손창우 한국금형공학회 2019 한국금형공학회지 Vol.13 No.1
The size and prospects of the domestic semiconductor equipment market are increasing every year. In the case of various parts used inside semiconductor equipments, high durability such as high strength and abrasion resistance is demanded. Particularly, the gases used in semiconductor production processes are toxic. In order to prevent such toxic gas leakage, a precision processing technique and a surface treatment technique for preventing corrosion are required. Electro-polishing is an electro-chemical method of polishing a metal surface to make it smooth and polished. Electro-polishing is mainly used in the finishing process of metal surface. Unlike mechanical polishing, electro-polishing is used in many fields, such as fine chemical etching equipment, since no damaged layer or burr, fine polishing groove and particles are generated. However, in order to withstand the gas used in the semiconductor equipment, the parts must have high corrosion resistance. However, the surface hardness generally become lowered through electro-polishing. Therefore, in this study, surface hardness were experimentally observed before and after electro-polishing. Then, a method of improving hardness by preparing a nitrided layer by plasma ion nitriding treatment.
PECVD법으로 증착된 $Ta_2O_5$박막의 누설전류에 미치는 RTA의 영향
김진범,이승호,소명기,Kim, Jin-Beom,Lee, Seung-Ho,So, Myeong-Gi 한국재료학회 1994 한국재료학회지 Vol.4 No.5
본 연구에서는 반응기체 $PaCl_5$ (99.99%)와 $N_2O$(99.99%)를 사용하여 PECVD법으로 P-type(100) Si기판위에 $Ta_2O_5$ 박막을 증착시킨후 RTA 후처리를 통하여 누설전류를 개선시키고자 하였다. 실험결과, 증착온도 증가에 따라 굴절율은 일정하게 증가하였고 $500^{\circ}C$에서 최대 증착속도를 보였다. 증착된 $Ta_2O_5$막의 FT-IR 분석결과 증착온도 증가에 따라 Ta-O bond peak intensity가 증가함을 알 수 있었으며, 누설전류 특정결과 증착온도가 증가함에 따라 누설전류값이 감소함을 알 수 있었다. 또한 증착된 $Ta_2O_5$막을 RFA방법을 이용하여 후처리 한 결과, as deposited 상태보다 누설전류가 감소함을 알 수 있었으며 이는 RTA처리후 AES와 FT-IR 분석을 통하여 $Ta_2O_5$막 내의 oxygen농도와 Ta-O bond peak intensity를 측정한 결과 RTA 후처리에 의하여 $Ta_2O_5$막내의 존재하는 O-deficient 구조들이 감소한 때문이었다. The effects of RTA treatment on the leakage current have been studied for tantalum pentoxide( $Ta_2O_5$) films deposited by PECVD on P-type(100) Si substrate using $TaCl_5$(99.99%) and $N_2O$(99.99%) gaseous mixture. The refractive index increased with increasing the deposition temperature and the maximum deposition rate was obtained at $500^{\circ}C$. The Ta-0 bond peak intensity of as-deposited $Ta_2O_5$ increased with increasing the deposition temperature through FT-IR analysis and the leakage current value was decreased with increasing the deposition temperature. The small leakage current value obtained after RTA treatment of as-deposited $Ta_2O_5$ was found to be due to the reduction of 0-deficient structure in the film. The increases of the oxygen coacentration and the Ta-0 bond peak intensity in the film after RTA treatment were measured by AES and FT-IR analyses.
도시폐기물 소각공정에서의 다이옥신 배출특성(Ⅰ) : 방지시설의 영향;The Effect of Air Pollution Control Device
김진범,이우근 江原大學校 附設 環境硏究所 2000 環境硏究 Vol.17 No.-
본 연구는 도시폐기물 소각장 배출가스 중의 다이옥신 배출특성을 알아보기 위해 수행되었다. 소각로 내의 각 방지장치에서 측정된 결과에 의하면, 촉매반응탑 입구에서 가장 많은 양의 다이옥신이 측정되었다. 따라서 전기집진기는 다이옥신이 생성되는데 적당한 조건을 제공하는 것으로 보인다. 다이옥신 농도는 계절에 따라 큰 차이를 보여 겨울에 측정된 다이옥신 농도가 가을보다 높았는데, 도시폐기물의 조성, 소각로 운전조건 등이 다이옥신 생성에 영향을 주고 있음을 제시해 준다. This study is carried out to investigate the discharge characteristics of PCDD/Fs from municipal solid waste(MSW) incinerator. According to the results measured at several air pollution control devices(APCDs) are found at selective catalytic reduction(SCR) inlet. Therefore, it concludes that the electrostatic precipitator(EP) provides the appropraiate condition for the formation of PCDD/Fs. The concentration of PCDD/Fs shows a large difference with the season. The concentration of PCDD/Fs in winter is higher than that of autumn, which suggests that the formation of PCDD/Fs is affected by the MSW components and the operation condition of municipal solid waste incinerator(MSWI).
김진범 대한소아청소년과학회 2008 Clinical and Experimental Pediatrics (CEP) Vol.51 No.2
Dental caries is the first disease to cause the pathological extraction of teeth in children. The complete prevention of dental caries is not achieved by toothbrushing alone. The use of fluoride and pit and fissure sealant is regarded as key tools to prevent dental caries. Fluoride-containing tablets or multi-vitamins and community water fluoridation can be used as systemic application techniques. Professional fluoride application, fluoride iontophoresis on teeth, fluoride mouth rinsing and fluoride- containing toothpaste can be used as local application techniques. Pit and fissure sealant is mainly used to prevent dental caries on occlusal surfaces of premolars and molars. Sweeteners not to occur dental caries has been developed to substitute sucrose. Dental erosion increases according to the high consumption of acidic soft drink or beverages. The appropriate use of fluoride and pit and fissure sealant are recommended to prevent dental caries effectively and the education is required to reduce the consumption of acidic soft drinks or beverages to decrease dental erosion.