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타게트 제조조건이 퍼멀로이 박막의 보자력 및 투자율에 미치는 영향
김현태(H. T. Kim),김상주(S. J. Kim),한석희(S. H. Han),김희중(H. J. Kim),강일구(I. K. Kang),김인응(I. E. Kim) 한국자기학회 1994 韓國磁氣學會誌 Vol.4 No.4
Permalloy films were deposited by an RF magnetron sputtering method using several different targets which had been cold-rolled and annealed at various temperatures to give different microstructure and texture. The grain refinement occurs at high temperature annealing due to recrystallization and subsequently the initial (110) target texture transforms to the random texture. The coercive forces of thin films fabricated using targets which are not recrystallized are below 0.2 Oe in the Ar pressure range of 1 ~ 5 mTorr and the lowest coercive force achieved is 0.07 Oe. The low value of coercive force, 0.25 Oe, is only obtained at the sputtering conditions of 400 W and 1 mTorr, and 300 W and 5 mTorr when recrystallized targets are used. The internal stress changes from compressive to tensile as the Ar pressure increases, the stress-free being at 5 mTorr. The changes of coercive force and permeability can be well interpreted by the differences from the composition and the internal stress.
퍼멀로이 박막의 보자력 및 실효투자율에 미치는 스퍼터링 조건의 영향
김현태(H. T. Kim),김상주(S. J. Kim),한석희(S. H. Han),김희중(H. J. Kim),강일구(I. K. Kang),김인응(I. E. Kim) 한국자기학회 1994 韓國磁氣學會誌 Vol.4 No.3
Effects of sputtering conditions such as the input power, Ar pressure and substrate bias voltage, on the magnetic properties of permalloy(NiFe) thin films have been studied. The films were fabricated by using an RF magnetron sputtering apparatus. The coercive force is obtained to be low in the input power of 300~400W and the Ar pressure of 1~5mTorr. The best magnetic properties of the films achieved in this work are ; 0.10Oe for the coercive force and 2800(1 ㎒) for the effective permeability. The coercive force increases with increasing the substrate bias voltage at the low Ar pressure. The Ni content decreases with Ar pressure. The internal stress induced during sputtering is compressive at low Ar pressure but it changes to tensile at high Ar pressure, the stress-free state being at about 5 mTorr. The present result indicates that the variation of the soft magnetic properties with sputtering condition results mainly from the changes in the composition and internal stress.