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패턴 된 미크론 자기박막 소자에서의 자기소거장 효과분석
김기출(Ki Chul Kim),서정대(Jeong-Dae Suh),김기보(K. B. Kim),이충선(C. S. Lee),송용진(Y. J. Song) 한국자기학회 2003 韓國磁氣學會誌 Vol.13 No.3
A micromagnetic model and a Stoner-Wohlfarth model are used to analyze the effect of demagnetization field in patterned permalloy films. Permalloy films of 20 ㎛×(40 ㎛~200 ㎛) are fabricated by DC magnetron sputtering and photo lithography. Measured magnetoresistance data of patterned permalloy films are compared with simulation results. The micromagnetic model gives a better agreement with the measured MR data than the Stoner-Wohlfarth model. Based on the simulation results, we propose a revised approximation formula for demagnetization field in Stoner-Wohlfarth model for a few ㎛ patterned magnetic films.