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420J2마르텐사이트 스테인레스강의 최종경도에 미치는 열처리조건의 영향
김기돈,성장현 ( K . D . Kim,J . H . Sung ) 한국열처리공학회 1994 熱處理工學會誌 Vol.7 No.3
The effect of batch annealing conditions and austenitizing temperatures on the hardness and microstructural factors were examined by using 420J2 martensitic stainless steel. In spite of the similler hardness after batch annealing, the difference in hardness at the same austenitizing temperature was caused by changes in dissolved carbon during batch annealing. The highest hardness of the specimen was obtained at the batch annealing temperature of 820℃ and austenitizing temperature of 1050℃. The main factor affecting the final hardness of the cold annealed 420J2 specimen was proved to the austenitizing temperature rather than batch annealing temperature.
저진공 Single-step UV 나노임프린트 장치 개발
김기돈(K. D. KIM),정준호(J. H. Jeong),이응숙(E. S. Lee),도현정(H. J. Do),신홍수(H. S. Shin),최우범(W. B. Choi) 한국정밀공학회 2006 한국정밀공학회 학술발표대회 논문집 Vol.2006 No.5월
UV-NIL is a promising technology for the fabrication of sub-100 nm features. Due to non-uniformity of the residual layer thickness (RLT) and a strong possibility of defects, many UV-NIL processes have been developed and some are commercially available at present, most are based on the “step-and-repeat” nanoimprint technique, which employs a small-area stamp, much smaller than the substrate. This is mainly because, when a large-area stamp is used, it is difficult to obtain acceptable uniform residual layer thickness and/or to avoid defects such as air entrapment. As an attempt to enable UV-NIL with a large-area stamp for high throughput, we propose a new UV-NIL tool that is able to imprint 4 inch wafer in a low vacuum environment at a single step.
플라즈마에칭에 의한 고분자 나노 잔디 구조 제작 및 반사방지막 응용 기술
최대근(D.-G. Choi),이기중(K. J. Lee),정준호(J. H. Jeong),김기돈(K. -D. Kim),최준혁(J. -H. Choi),이응숙(E. -S. Lee) 한국정밀공학회 2008 한국정밀공학회 학술발표대회 논문집 Vol.2008 No.6월
플라즈마에 의한 나노 잔디 구조가 반사방지막에 효과가 있음을 확인하고 향후 지속적인 연구로 조건을 최적화 할 경우 반사방지를 위한 저가 몰드 제작공정으로 유용하게 응용 가능함을 확인하였다.