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Fast Analysis of Film Thickness in Spectroscopic Reflectometry using Direct Phase Extraction
김광락,권순양,박희재 한국광학회 2017 Current Optics and Photonics Vol.1 No.1
A method for analysis of thin film thickness in spectroscopic reflectometry is proposed. In spectroscopic reflectometry, there has been a trade-off between accuracy and computation speed using the conventional analysis algorithms. The trade-off originated from the nonlinearity of spectral reflectance with respect to film thickness. In this paper, the spectral phase is extracted from spectral reflectance, and the thickness of the film can be calculated by linear equations. By using the proposed method, film thickness can be measured very fast with high accuracy. The simulation result shows that the film thickness can be acquired with high accuracy. In the simulation, analysis error is lower than 0.01% in the thickness range from 100 nm to 4 um. The experiments also show good accuracy. Maximum error is under 40 Å in the thickness range 3,000-20,000 Å. The experiments present that the proposed method is very fast. It takes only 2.6 s for volumetric thickness analysis of 640*480 pixels. The study suggests that the method can be a useful tool for the volumetric thickness measurement in display and semiconductor industries.
김광락,김성령,권순양,박희재 한국정밀공학회 2014 International Journal of Precision Engineering and Vol. No.
In this paper, volumetric thin film thickness is measured using the spectroscopic imaging reflectometer, which consists of a microscopyoptic system, variable bandpass filter and CCD camera. The volumetric thickness profile can be measured by using each pixel of theCCD camera as a spectrum sensor. The causes of reflectance modeling errors are explained, and equations for compensation areproposed. For the verification of system performance and proposed equations, the thickness of silicon oxide thin film is measured. Ellipsometer and AFM measurement results are used as nominal thicknesses for comparisons with the result of spectroscopic imagingreflectometer. From the comparisons, it is verified that the proposed equations can improve accuracy of measurement. It can be saidthat the proposed equations can properly compensate the error due to Gaussian distribution of filtering and lens NA.