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DC 마그네트론 스퍼터링 방법에 의해 증착된 Mo 박막의 특성
공선미 ( Seon Mi Kong ),소우빈 ( Yu Bin Xiao ),김은호 ( Eun Ho Kim ),정지원 ( Chee Won Chung ) 한국화학공학회 2011 Korean Chemical Engineering Research(HWAHAK KONGHA Vol.49 No.2
Mo thin films were deposited on soda lime glass at room temperature by using DC magnetron sputtering. The electrical and structural properties of the films were investigated by varying DC power and gas pressure as the deposition parameter. As DC power increased, the deposition rate of Mo films was increased and the electrical resistivity was decreased. It was observable that the crystallinity of the films was improved with increasing DC power. As gas pressure decreased, the deposition rate and resistivity of the films were decreased, and long rectangular grains were densely formed. With increasing gas pressure, the grains were transformed to a round shape and the voids on the film surface were increased. It was confirmed that the electrical resistivity of Mo films was increased as the amount of oxygen combined with Mo atoms increased. It was also disclosed that the films have low resistivity as the degree of coupling of oxygen with Mo was reduced due to the enhancement of the crystallinity of the films.