http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
- 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
- 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
RISS 인기검색어
- 검색키워드
- 발행기관 : 세종대학교 대학원 전자공학과 (검색결과 1 건)
-
선택적 에미터를 통한 대면적 결정질 실리콘 태양전지 효율 향상에 관한 연구 세종대학교 대학원 전자공학과 김 일 환
김일환 세종대학교 대학원 전자공학과 2014 국내석사
The explosion of PV production across the globe in the past few years has shown the possibility for opening new renewable energy era, especially in solar as one of the promising energy sources. Though we are passing through the dimly lit tunnel of tough solar market, facing drop in prices and reorganization of solar market today, we can expect more bright future in the very near future for the increase in PV installation year by year and emerging new markets. One of the main objectives of today’s solar cell research and manufacturing is to reduce cost per watt peak. This can be achieved not only by reducing the production cost of the cells but also by increasing the cell efficiency with only moderate raise of the cell production cost. Cell concepts such as the HIT cell of previous Sanyo or the IBC cell of Sunpower are concepts that generally achieve very high efficiencies, but suffer from increasing production costs. Currently, the standard cell process by applying screen printed front side electrode on top of a SiNx ARC and full area rear side metal contact dominates the PV market, and besides some companies are trying to increase cell efficiency with few additional processing steps. This work focuses on the improvement of the cell efficiency by adopting laser Doping and etch paste for fabrication of selective Emitter solar cells. These two methods allow selective emitter formation with low doping regions between fingers, enhancing blue response by lowering the surface recombinations. In this paper, we have carried out optimization of laser Doping and etch paste process. Laser Doping is an alternative to conventional thermal annealing to form PN juctions in silicon solar cells. The laser processing has many advantages such as simple and low temperature process, high throughput, and low cost of ownership. For fabrication of selective low sheet resistance regions, we have used phosphosilicate glass layer as an dopant source, which was produced after furnace diffusion. Etch paste method also has advantages such as good uniformity, high efficiency compared to other methods. In this paper, I-V measurement, IQE measurment and lifetime mapping analysis have been used to investigate the elelctrical and optical properties of the several batches of selective Emitter solar cells. We have achieved the efficiency of 18.88% and 19.05% by using the laser Doping and etch paste process, respectively. Although the cell efficiency in selective Emitter solar cell fabricated by using etch paste is better than that of the cell by laser Doping, the laser Doping can be applied to conventional manufacturing systems directly because the laser Doping needs only single additional step. On the other hand, for the case of etch paste, three more additional process steps are needed to form selective Emitter when compared with the laser Doping process. By comparing two methods for fabrication of selective Emitter solar cells, we have shown the laser Doping is more useful method for applying industrial solar cell fabrication.
연관 검색어 추천
이 검색어로 많이 본 자료
활용도 높은 자료
