1 "대향타겟식 스퍼터링에 의한 Co-Cr 박막의 제작" 11 (11): 418-, 1998.
2 "대향타겟스퍼터링법에 의한 FBAR용 AZO 박막의 제작" z 17 (z 17): 442-, 2004.
3 "Surface modification if indium tin oxide by plasma treatment" 1384-, 1997.
4 "Struc- ture and electrical properties of ITO thin films deposited at high rate by facing target sputtering" 445 : 245-, 2003.
5 "Mass spectrometric ion analysis in the sputtering of oxide targets" a10 : 1719-, 1992.
6 "FBAR용 ZnO/SiO2/Si 박막의 결정학적 특성에 관한 연구" 16 (16): 711-, 2003.
7 "Electroluminescence in conjugated polymers" 121-, 1999.
8 "Effect of hydrogen partial pressure on opoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering me- thod" 974-, 1999.
9 "Development of indium tin oxide film texture during DC magnetron sputtering deposition" 343-, 2003.
1 "대향타겟식 스퍼터링에 의한 Co-Cr 박막의 제작" 11 (11): 418-, 1998.
2 "대향타겟스퍼터링법에 의한 FBAR용 AZO 박막의 제작" z 17 (z 17): 442-, 2004.
3 "Surface modification if indium tin oxide by plasma treatment" 1384-, 1997.
4 "Struc- ture and electrical properties of ITO thin films deposited at high rate by facing target sputtering" 445 : 245-, 2003.
5 "Mass spectrometric ion analysis in the sputtering of oxide targets" a10 : 1719-, 1992.
6 "FBAR용 ZnO/SiO2/Si 박막의 결정학적 특성에 관한 연구" 16 (16): 711-, 2003.
7 "Electroluminescence in conjugated polymers" 121-, 1999.
8 "Effect of hydrogen partial pressure on opoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering me- thod" 974-, 1999.
9 "Development of indium tin oxide film texture during DC magnetron sputtering deposition" 343-, 2003.