1 Sheats, J. R., "Technology roadmap for nanoelectronics" Marcel Dekker Inc. 1998
2 Bae, Y. C., "Submicron Patterning in Electron Beam Lithography using Trilayer Resist" 31A (31A): 1358-1364, 1994
3 Chang, T. H. P., "Proximity Effect in E-beam Lithography" 12 (12): 1271-1275, 1975
4 Rishton, S. A., "Point exposure distribution measurements for proximity correction in electron beam lithography on a sub-100 nm scale" 5 (5): 135-141, 1987
5 Kim, J. G., "Nano-machining Technology Using Electron Beam" 25 (25): 7-14, 2008
6 Chun, K. J., "Lithography 기술 현황 및 향후 전망" 19 (19): 377-388, 1992
7 Madou, M. J., "Fundamentals of microfabrication" CRC press 53-57, 2001
8 Nastaushev, Y. V., "Energy deposition functions in electron resist films on substrates" C19 : 189-192, 2002
9 Ham, Y. M., "Development parameter measurement and profile analysis of electron beam resist for lithography simulation" 33A (33A): 1396-1402, 1996
10 Parikh, Mihir, "Corrections to proximity effects in electron beam lithography. I. Theory" 50 (50): 4371
1 Sheats, J. R., "Technology roadmap for nanoelectronics" Marcel Dekker Inc. 1998
2 Bae, Y. C., "Submicron Patterning in Electron Beam Lithography using Trilayer Resist" 31A (31A): 1358-1364, 1994
3 Chang, T. H. P., "Proximity Effect in E-beam Lithography" 12 (12): 1271-1275, 1975
4 Rishton, S. A., "Point exposure distribution measurements for proximity correction in electron beam lithography on a sub-100 nm scale" 5 (5): 135-141, 1987
5 Kim, J. G., "Nano-machining Technology Using Electron Beam" 25 (25): 7-14, 2008
6 Chun, K. J., "Lithography 기술 현황 및 향후 전망" 19 (19): 377-388, 1992
7 Madou, M. J., "Fundamentals of microfabrication" CRC press 53-57, 2001
8 Nastaushev, Y. V., "Energy deposition functions in electron resist films on substrates" C19 : 189-192, 2002
9 Ham, Y. M., "Development parameter measurement and profile analysis of electron beam resist for lithography simulation" 33A (33A): 1396-1402, 1996
10 Parikh, Mihir, "Corrections to proximity effects in electron beam lithography. I. Theory" 50 (50): 4371
11 Seo, T. W., "3-D Resist Profile Simulation using String Model on E-beam Lithography" 33A (33A): 1094-1100, 1996