In this paper aluminium-doped zinc oxide(ZnO:Al) conducting layer was deposited on polyethylene terephthalate(PET) substrate by r. f. magnetron sputtering method PET substrate was modified by a DBD(dielectric barrier discharge) plasma before sputterin...
In this paper aluminium-doped zinc oxide(ZnO:Al) conducting layer was deposited on polyethylene terephthalate(PET) substrate by r. f. magnetron sputtering method PET substrate was modified by a DBD(dielectric barrier discharge) plasma before sputtering to improve the electric and optical properties of ZnO:Al film and to increase also the deposition rate The effect of heat treatment time on the dectrical, optical, chemical and structural properties of ZnO:Al thin film were investigated experimentally The PET films modified with the DBD plasma showed a significant decrease in water contact angle The deposition rate of ZnO:Al film in the case of the plasma-treated substrate was also increased by around 2 times compared to the untreated substrate The minimum resistivity of about 28×10-3 Ω-cm and transmittance of about 83.3% were obtained under the experimental condition of 6min of heat treatment time.