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RISS 인기검색어
- 검색키워드
- 저자 : Ross Henry Hill (검색결과 2 건)
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Photo-induced hybrid nanopatterning of metal oxide via direct imprint lithography
박형호(Hyeong-Ho Park),최대근(Dae-Geun Choi),Xin Zhang,김기돈(Ki-don Kim),최준혁(Jun-Hyuk Choi),이지혜(Jihye Lee),박형호(Hyung-Ho Park),Ross Henry Hill,이응숙(Eung-Sug Lee),정준호(Jun-Ho Jeong) 한국생산제조학회 2011 한국생산제조시스템학회 학술발표대회 논문집 Vol.2011 No.4
A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive zirconyl 2-ethylhexanoate is presented for the fabrication of both amorphous and crystalline zirconium dioxide (ZrO₂) nanostructures. Upon annealing at 400 C for 1 h, the lateral shrinkage and thickness shrinkage of ZrO₂ nanostructures were 69.8 and 66.7%, respectively, indicating an isotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated ZrO₂ film is gradually increased by improvement in the packing density and crystallinity of the film. With increasing UV exposure time and annealing temperature, the optical band gap (Eg) of the UV-irradiated ZrO₂ film is red-shifted from 5.745 to 5.265 eV, due to the removal of organic groups and the resultant densification of the film during the photochemical reaction and the heat-induced increase in the crystallinity of the film. These results suggest that the refractive index and optical Eg of ZrO₂ nanostructures could be controlled by tuning the conditions of UV exposure time and annealing treatment. Nanopatterns of ZrO₂, fabricated by direct UV-assisted nanoimprint lithography, are potential candidates for protective coatings for optical mirrors and filters, e.g. high-reflectivity mirrors and broadband interference filters, as well as active electro-optical devices where ordered surface nanostructures are necessary.
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Photo-induced hybrid nanopatterning of titanium dioxide <i>via</i> direct imprint lithography
Park, Hyeong-Ho,Choi, Dae-Geun,Zhang, Xin,Jeon, Sohee,Park, Seong-Je,Lee, Soon-Won,Kim, Sarah,Kim, Ki-don,Choi, Jun-Hyuk,Lee, Jihye,Yun, Dae Keun,Lee, Ki Joong,Park, Hyung-Ho,Hill, Ross Henry,Jeong, J Royal Society of Chemistry 2010 Journal of materials chemistry Vol.20 No.10
<P>A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive titanium(<SMALL>IV</SMALL>) di-n-butoxide bis(2-ethylhexanoate) is presented for the fabrication of well-ordered titanium dioxide (TiO<SUB>2</SUB>) nanostructures at room temperature. The main novelty of this technique is the use of the photosensitive titanium organic compound, rather than a commonly used UV-curable resin, for direct UV-assisted nanoimprint lithography. Fourier transform infrared and X-ray photoelectron spectroscopy studies suggest that exposure to UV light resulted in the gradual removal of organic groups from films prepared from titanium(<SMALL>IV</SMALL>) di-n-butoxide bis(2-ethylhexanoate) photochemically and successively converted the films to TiO<SUB>2</SUB> at room temperature. This approach allows direct fabrication of TiO<SUB>2</SUB> nanopatterns with lines down to 35 nm in width, hole arrays of 265 nm in diameter, and three-dimensional TiO<SUB>2</SUB> hybrid micro/nano-patterns without observable defects for use in applications where ordered surface nanostructures are required, such as photovoltaics, photonics, and optical waveguides.</P> <P>Graphic Abstract</P><P>A novel UV-assisted imprinting procedure that employs photosensitive Ti(<SMALL>IV</SMALL>) di-n-butoxide bis(2-ethylhexanoate) is presented for the fabrication of well-ordered TiO<SUB>2</SUB> and 3-D TiO<SUB>2</SUB> hybrid micro/nano-patterns at room temperature. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=b921343k'> </P>
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