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        Structural and Optical Properties of Titanium Oxide Thin Films Deposited on Unheated Substrate at Different Total Pressures by Reactive dc Magnetron Sputtering with a Substrate Bias

        Wie Zhou,Xiaoxia Zhong,Luqi Yaun,Qiwei Shu,Xiaochen Wu,Yuxing Xia 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.49 No.5I

        Titanium-oxide (TiO2) thin films were deposited on unheated (111)-Si substrates by reactive dc magnetron sputtering with a substrate bias voltage of .100 V. A pure metallic titanium target was sputtered in a mixture of argon and oxygen. The structure and the optical properties of the deposited films were studied by changing the value of the total sputtering pressure. X-ray diffraction patterns show the following features: (a) only one wide rutile (110) diffraction peak was observed at a total sputtering pressure of 0.3 Pa; (b) no diffraction peak was observed at 1.2 Pa, implying an amorphous phase; (c) a TiO2 film with a pure anatase phase was obtained at 3.6 Pa, and the dominant diffraction was from the anatase (101) planes. The surface morphology was characterized with atomic force microscopy, and the roughness of the surface was found to increase with the crystal size derived from the XRD data. The optical constants were determined by using spectroscopic ellipsometry. The film deposited at 0.3 Pa, a rutile phase, possessed both a high refractive index and a low extinction coefficient. The value of the optical bandgap for the deposited on films in this experiment was much higher than the reported experimental and theoretical values.D

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