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연료전지 및 바나듐 흐름전지 용 폴리설폰 소재 기반 음이온 교환막
정민석,Christopher Arges,Javier Parrondo,Vijay Ramani 한국막학회 2016 한국막학회 총회 및 학술발표회 Vol.2016 No.11
The water uptake, ionic conductivity, vanadium (VO2+) permeability and stability of polysulfone (PSF) based AEMs in alkaline media and in strongly oxidizing solutions were assessed. The highest ion conductivity was obtained with PSF-trimethylammonium (TMA)+. PSF-TMA+ also had better alkaline stability in comparison to PSF-AEM with different bases. PSF-TMA+ was demonstrated to show fuel cell performance. PSF-TMA+ demonstrated a 40-fold reduction in vanadium (VO2+) permeability when compared to Nafion® membrane. Comprehensive 2D NMR studies verified that PSF-TMA+ remained chemically stable even after exposure to a 1.5 M vanadium(V) solution for 90 days. Excellent energy efficiencies (85%) were attained and sustained over several charge–discharge cycles for a vanadium redox flow battery prepared using the PSF-TMA+ separator.
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Xiong, Shisheng,Li, Dongxue,Hur, Su-Mi,Craig, Gordon S. W.,Arges, Christopher G.,Qu, Xin-Ping,Nealey, Paul F. American Chemical Society 2018 Macromolecules Vol.51 No.18
<P>Using a combination of systematic experiments and Monte Carlo simulations, this report demonstrates that the distribution of neutral solvent has a strong impact on the quality and kinetics of the self-assembly of block copolymers in thin films. Both methyl ethyl ketone (MEK, a good solvent) and acetone (a relatively poor solvent) were used for the solvent vapor annealing (SVA) of thin films of poly(2-vinylpyridine)-<I>block</I>-polystyrene-<I>block</I>-poly(2-vinylpyridine) (VSV) triblock copolymer. Acetone, the poorer solvent, accumulated at the interface of the VSV domains, while MEK was distributed more uniformly throughout the VSV. As a result, acetone screened the interactions between the blocks of the copolymer more than MEK. Because MEK afforded less screening of the different blocks, solvent annealing with MEK led to self-assembly of lower molecular weight VSV triblock copolymers than was possible with acetone. Solvent annealing with MEK also led to slower self-assembly kinetics and smaller correlation lengths in the assembled pattern compared to solvent annealing with acetone. Finally, long-range ordered structures of low molecular weight VSV triblock copolymer on a chemical pattern via directed self-assembly was demonstrated with 6× density multiplication by annealing in MEK.</P> [FIG OMISSION]</BR>
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