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실리콘 미세 가공을 이용한 열전형 미소유량센서 제작 및 특성
이영화 ( Young Hwa Lee ),노성철 ( Sung Cheoul Roh ),나필선 ( Pil Sun Na ),김국진 ( Kook Jin Kim ),이광철 ( Kwang Chul Lee ),최용문 ( Yong Moon Choi ),박세일 ( Se Il Park ),임영언 ( Young Eon Ihm ) 한국센서학회 2005 센서학회지 Vol.14 No.1
N/A A thermoelectric flow sensor for small quantity of gas flow rate was fabricated using silicon wafer semiconductor process and bulk micromachining technology. Evanohm R alloy heater and chromel-constantan thermocouples were used as a generation heat unit and sensing parts, respectively. The heater and thermocouples are thermally isolated on the Si₃N₄/ SiO₂/Si₃N₄ laminated membrane. The characteristics of this sensor were observed in the flow rate range from 0.2 slm to 1.0 slm and the heater power from 0.72 mW to 5.63 mW. The results showed that the sensitivities ((??(ΔV)/??(q)); AV : voltage difference, 4 : flow rate) were increased in accordance with heater power rise and decreasing of flow rate.