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고정수(J. S. Ko),오부국(B. K. Oh),김두영(D. Y. Kim),이재영(J. Y. Lee),이승기(S. K. Lee),정수화(S. H. Jung),홍순국(S. K. Hong) 한국레이저가공학회 2011 한국레이저가공학회지 Vol.14 No.3
As an active emission display using emissive polymer has had much attention recently, needs for a selective patterning of emissive layer for those displays have been increased abruptly. Therefore, the various laser sources in terms of its wavelength has been used for laser direct patterning. In this work, the feasibility of those processes is examined using numerical analysis and the experimental investigation. A sample has multi-layered structure, emissive polymer on aluminum which is deposited on a glass substrate. Key factors for optimizing the laser patterning of the emissive polymer are considered into the control of ablation products, large-sized particle, and the choice of the appropriate wavelength for minimizing the heat affected zone and the remnant layer.